台湾光罩为专门的光罩制造公司,生产IC业用的光罩,且提供客制化生产。
顺应半导体行业的快速且持续发展，台湾光罩持续开发新产品及制程，并压缩产品交期，满足客户需求。
随着晶圆代工厂IC芯片制造的不断发产及进步，台湾光罩提供一般Binary光罩外，更提供高阶制程需求的KrF 及ArF光源相位移光罩 (PSM)。
相关光罩规格参考如下

• 5X , 4X , 2.5X , 2X , Reticle for stepper

  Reticle Material	Quartz
  Reticle Dimension	5"x5"x0.09" 5"x5"x0.18" 6"x6"x0.12" 6"x6"x0.25"
  Stepper Type	ASML,NIKON,CANON
  CD Tolerance	Mean to target >=0.010 um Uniformity (3δ) >=0.010 um
  Registration	>=0.020 um
  Defect	0.09 um

• 1X Photomask (PE / MPA)

  Reticle Material	Quartz
  Reticle Dimension	4"x4"x0.09" 5"x5"x0.09" 6"x6"x0.12" 7"x7"x0.12" 7"x7"x0.15"
  CD Tolerance	±0.1 um
  Registration	±0.2 um
  Defect	<= 1dpsi @ 1um

• 1X Photomask (PLA)

  Reticle Material	SODA LINE
  Reticle Dimension	4"x4"x0.09" 5"x5"x0.09" 6"x6"x0.12" 7"x7"x0.12" 9"x9"x0.12"
  CD Tolerance	±0.3 um
  Registration	±2 um
  Defect	<= 2dpsi @ 2um

• UT 1X Reticle

  Reticle Material	Quartz
  Reticle Dimension	3"x5"x0.09" 5"x5"x0.09" 6"x6"x0.25"
  CD Tolerance	±0.05 um
  Registration	±0.1 um
  Defect	0.5 um

• Large Area Mask (LAM)

  Reticle Material	SODA LINE
  Reticle Dimension	7"x7"x0.12" 9"x9"x0.12" 355.6x355.6x4.8 mm 520x420x4.8 mm
  Min Line/Space	3 um
  Line Tolerance	±1.0 um
  Defect	5 um