臺灣光罩為專門的光罩製造公司,生產IC業用的光罩,且提供客制化生產。
順應半導體行業的快速且持續發展，臺灣光罩持續開發新產品及制程，並壓縮產品交期，滿足客戶需求。
隨著晶圓代工廠IC晶片製造的不斷發產及進步，臺灣光罩提供一般Binary光罩外，更提供高階制程需求的KrF 及ArF光源相位移光罩 (PSM)。
相關光罩規格參考如下

• 5X , 4X , 2.5X , 2X , Reticle for stepper

  Reticle Material	Quartz
  Reticle Dimension	5"x5"x0.09" 5"x5"x0.18" 6"x6"x0.12" 6"x6"x0.25"
  Stepper Type	ASML,NIKON,CANON
  CD Tolerance	Mean to target >=0.010 um Uniformity (3δ) >=0.010 um
  Registration	>=0.020 um
  Defect	0.09 um

• 1X Photomask (PE / MPA)

  Reticle Material	Quartz
  Reticle Dimension	4"x4"x0.09" 5"x5"x0.09" 6"x6"x0.12" 7"x7"x0.12" 7"x7"x0.15"
  CD Tolerance	±0.1 um
  Registration	±0.2 um
  Defect	<= 1dpsi @ 1um

• 1X Photomask (PLA)

  Reticle Material	SODA LINE
  Reticle Dimension	4"x4"x0.09" 5"x5"x0.09" 6"x6"x0.12" 7"x7"x0.12" 9"x9"x0.12"
  CD Tolerance	±0.3 um
  Registration	±2 um
  Defect	<= 2dpsi @ 2um

• UT 1X Reticle

  Reticle Material	Quartz
  Reticle Dimension	3"x5"x0.09" 5"x5"x0.09" 6"x6"x0.25"
  CD Tolerance	±0.05 um
  Registration	±0.1 um
  Defect	0.5 um

• Large Area Mask (LAM)

  Reticle Material	SODA LINE
  Reticle Dimension	7"x7"x0.12" 9"x9"x0.12" 355.6x355.6x4.8 mm 520x420x4.8 mm
  Min Line/Space	3 um
  Line Tolerance	±1.0 um
  Defect	5 um