TMC is specialized in the research, development, manufacturing and sales of photomasks. We produce the mold for the manufacturing of IC and it is a build-to-order product. Conforming to the fast growth and continual evolution in semiconductor industry, we keep fully supplying all the needs of photomasks and contribute compression cycle time for new developed products, which always satisfy to our customers. With ongoing development and improvement of IC chip manufacturing in foundries, TMC supply photomasks and reticles for the following products.

• 5X , 4X , 2.5X , 2X , Reticle for stepper

  Reticle Material	Quartz
  Reticle Dimension	5"x5"x0.09" 5"x5"x0.18" 6"x6"x0.12" 6"x6"x0.25"
  Stepper Type	ASML,NIKON,CANON
  CD Tolerance	Mean to target >=0.010 um Uniformity (3δ) >=0.010 um
  Registration	>=0.020 um
  Defect	0.09 um

• 1X Photomask (PE / MPA)

  Reticle Material	Quartz
  Reticle Dimension	4"x4"x0.09" 5"x5"x0.09" 6"x6"x0.12" 7"x7"x0.12" 7"x7"x0.15"
  CD Tolerance	±0.1 um
  Registration	±0.2 um
  Defect	<= 1dpsi @ 1um

• 1X Photomask (PLA)

  Reticle Material	SODA LINE
  Reticle Dimension	4"x4"x0.09" 5"x5"x0.09" 6"x6"x0.12" 7"x7"x0.12" 9"x9"x0.12"
  CD Tolerance	±0.3 um
  Registration	±2 um
  Defect	<= 2dpsi @ 2um

• UT 1X Reticle

  Reticle Material	Quartz
  Reticle Dimension	3"x5"x0.09" 5"x5"x0.09" 6"x6"x0.25"
  CD Tolerance	±0.05 um
  Registration	±0.1 um
  Defect	0.5 um

• Large Area Mask (LAM)

  Reticle Material	SODA LINE
  Reticle Dimension	7"x7"x0.12" 9"x9"x0.12" 355.6x355.6x4.8 mm 520x420x4.8 mm
  Min Line/Space	3 um
  Line Tolerance	±1.0 um
  Defect	5 um